The Centre for Process Innovation
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CPI Barrier and Vacuum Encapsulation
High performance large area coatings and processes
CPI has extensive experience in the deposition and characterisation of barrier layers. We offer access to a wide variety of thin-film deposition systems including batch and roll to roll atomic layer deposition (ALD), roll to roll sputtering and also a range of other sputtering and vacuum coating technologies.
CPI is engaged in a wide range of projects initially focussing on thin-film barrier technology for long-lasting and efficient flexible electronic devices. Further developments, up to pilot scale, are targeted in printable electronics applications in the display, photovoltaics, lighting and sensor fields with both rigid and flexible substrates utilising batch and processing techniques.
CPI’s equipment includes:
Roll to roll atomic layer deposition
Batch atomic layer deposition
Pilot scale roll to roll sputtering
In-line and batch sputtering
In-line HiTUS sputtering coater (low ion energy bombardment during film growth)
Analysis, characterisation and metrology
CPI can offer:
Access to a wide variety of thin-film deposition systems
Industry experts in a wide range of vacuum processing and deposition technologies
Expertise in combining vacuum coatings with more conventional coating technologies
Expertise in a wide range of applications, including barrier and other coatings for application in printed electronics, optical, photovoltaic and other applications
Access to a network of coating support and analytical capabilities, including barrier permeation characterisation
(CPI)